Research on Efficient Nitrogen Removal Technology in Semiconductor Wastewater

Abstract

The semiconductor industry, as the core driver of the digital economy, has brought increasingly severe wastewater treatment challenges as a result of its rapid development. Semiconductor wastewater is characterized by high concentrations of pollutants, complex composition, and high treatment difficulty, especially high nitrogen and high salt wastewater, which puts forward higher requirements for traditional treatment processes. This study focuses on the technical bottlenecks of semiconductor wastewater treatment, and through a combination of literature review and engineering case study, systematically researches the current status and development trend of the application of synergistic denitrification technology in the treatment of semiconductor wastewater, and focuses on the operation mechanism and optimization strategy of the short-range nitrification-anaerobic ammonia oxidation (PN/A) synergistic process. The results show that the synergistic denitrification technology shows significant advantages in semiconductor wastewater treatment: the PN/A combined process can achieve a nitrogen removal efficiency of 92.5% under the condition that the ammonia concentration of the influent water is 380-450 mg/L, and the energy consumption is reduced by more than 60% compared with that of the traditional process.This study not only improves the theoretical system of biological denitrification under complex water quality conditions but also provides an important technical support to promote the green and sustainable development of the semiconductor industry, which is of great theoretical and practical significance to realize the goal of "near-zero discharge" of industrial wastewater.