LI, Dongyang. Advancements and Challenges in Photomask Technologies for Semiconductor Lithography: A Comparative Review of Binary, PhaseShift, and EUV Masks. Science and Technology of Engineering, Chemistry and Environmental Protection, [S. l.], v. 2, n. 5, p. 4062, 2024. DOI: 10.61173/yemhty34. Disponível em: https://stecep.deanfrancis.press/article/view/1613. Acesso em: 4 nov. 2026.