LI, Wenze; ZHANG, Haoran. Research Progress and Application of Ion Implantation in Semiconductor Devices. Science and Technology of Engineering, Chemistry and Environmental Protection, [S. l.], v. 4, n. 1, p. 14442, 2026. DOI: 10.61173/kwtxmb87. Disponível em: https://stecep.deanfrancis.press/article/view/331. Acesso em: 4 nov. 2026.