WANG, Zeheng. Current Status and Trends in EUV and NIL Lithography Process Development. Science and Technology of Engineering, Chemistry and Environmental Protection, [S. l.], v. 3, n. 6, p. 13322, 2025. DOI: 10.61173/qqmb3j39. Disponível em: https://stecep.deanfrancis.press/article/view/471. Acesso em: 4 nov. 2026.