Li D. Advancements and Challenges in Photomask Technologies for Semiconductor Lithography: A Comparative Review of Binary, PhaseShift, and EUV Masks. STECEP [Internet]. 2024 Oct. 29 [cited 2026 Nov. 4];2(5):4062. Available from: https://stecep.deanfrancis.press/article/view/1613